Rapid Thermal Process (Mila 5000 Mini Lamp)

Rapid Thermal Processing (RTP) has become an important heating technique for annealing semiconductors, ferroelectrics and other thin film devices. MILA-5000 Mini Lamp is a compact table top RTP system that vacuum, gas, gas flow or air can be selected as the heating atmosphere during heating and cooling.
 

• Maxima temp: 1200 °C
• Maxima heating rate: 50 °C /sec
• Provides 16 modes of heating process

By giving different modes of rapid annealing and cooling, the facility is able to vary materials' microstructures and properties significantly.